Effect of exposing Se pre-implanted polycrystalline SiC to maximum electronic energy loss of 33.7 keV/nm and annealing

dc.contributor.authorMabelane, T.S.
dc.contributor.authorAbdalla, Zaki Adam Yousif
dc.contributor.authorSkuratov, V.A.
dc.contributor.authorNtshangase, S.S.
dc.contributor.authorMasikane, S.C.
dc.contributor.authorHlatshwayo, Thulani Thokozani
dc.contributor.emailu22019937@tuks.co.zaen_US
dc.date.accessioned2025-04-22T10:58:15Z
dc.date.available2025-04-22T10:58:15Z
dc.date.issued2025-05
dc.descriptionDATA AVAILABILITY : Data will be made available on request.en_US
dc.description.abstractPlease read abstract in the article.en_US
dc.description.departmentPhysicsen_US
dc.description.librarianhj2025en_US
dc.description.sdgSDG-07:Affordable and clean energyen_US
dc.description.sponsorshipThe National Research Foundation (NRF) of South Africa.en_US
dc.description.urihttps://www.sciencedirect.com/journal/surfaces-and-interfacesen_US
dc.identifier.citationMabelane, T.S., Abdalla, Z.A.Y., Skuratov, V.A. et al. 2025, 'Effect of exposing Se pre-implanted polycrystalline SiC to maximum electronic energy loss of 33.7 keV/nm and annealing', Surfaces and Interfaces, vol. 64, art. 106376, pp. 1-11, doi : 10.1016/j.surfin.2025.106376.en_US
dc.identifier.issn2468-0230 (online)
dc.identifier.other10.1016/j.surfin.2025.106376
dc.identifier.urihttp://hdl.handle.net/2263/102175
dc.language.isoenen_US
dc.publisherElsevieren_US
dc.rights© 2025 The Author(s). Published by Elsevier B.V. This is an open access article under the CC BY-NC license (http://creativecommons.org/licenses/by- nc/4.0/).en_US
dc.subjectSwift heavy ion (SHI)en_US
dc.subjectSilicon carbide (SiC)en_US
dc.subjectSeleniumen_US
dc.subjectAnnealingen_US
dc.subjectRecrystallizationen_US
dc.subjectSDG-07: Affordable and clean energyen_US
dc.titleEffect of exposing Se pre-implanted polycrystalline SiC to maximum electronic energy loss of 33.7 keV/nm and annealingen_US
dc.typeArticleen_US

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