Damage formation in Ge during Ar+ and He+ implantation at 15 K
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Date
Authors
Hayes, M.
Schroeter, A.
Wendler, E.
Wesch, W.
Auret, Francois Danie
Nel, Jacqueline Margot
Journal Title
Journal ISSN
Volume Title
Publisher
Elsevier
Abstract
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Description
Keywords
Implantation, RBS, Channelling, Ge
Sustainable Development Goals
Citation
M.Hayes, et al., Physica B (2009), doi:10.1016/j.physb.2009.09.021