Electronic and annealing properties of the E0.31 defect introduced during Ar plasma etching of germanium

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Authors

Auret, Francois Danie
Coelho, Sergio M.M.
Myburg, G.
Janse van Rensburg, Pieter Johan
Meyer, Walter Ernst

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Elsevier

Abstract

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Keywords

Ar plasma etching, DLTS, Annealing, Defects

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Citation

F.D.Auret,etal.,PhysicaB(2009),doi:10.1016/j.physb.2009.09.028