Electronic and annealing properties of the E0.31 defect introduced during Ar plasma etching of germanium
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Date
Authors
Auret, Francois Danie
Coelho, Sergio M.M.
Myburg, G.
Janse van Rensburg, Pieter Johan
Meyer, Walter Ernst
Journal Title
Journal ISSN
Volume Title
Publisher
Elsevier
Abstract
Please read abstract in article.
Description
Keywords
Ar plasma etching, DLTS, Annealing, Defects
Sustainable Development Goals
Citation
F.D.Auret,etal.,PhysicaB(2009),doi:10.1016/j.physb.2009.09.028