JavaScript is disabled for your browser. Some features of this site may not work without it.
Please note that UPSpace will be unavailable from Friday, 2 May at 18:00 (South African Time) until Sunday, 4 May at 20:00 due to scheduled system upgrades. We apologise for any inconvenience this may cause and appreciate your understanding.
The migration behaviour of strontium co-implanted with helium into SiC at room temperature and annealed at temperatures above 1000 °C
Hlatshwayo, Thulani Thokozani; Mokgadi, Thapelo Freddy; Sohatsky, A.; Abdalla, Zaki Adam Yousif; Skuratov, V.A.; Njoroge, Eric Gitau; Mlambo, M.
The study investigated the migration behaviour of Sr implanted into SiC in the presence of helium (He). Sr ions
were implanted into polycrystalline SiC samples (Sr-SiC) at room temperature (RT), and co-implanted with He
ions also at RT (Sr + He-SiC). The samples were then annealed isochronally at 1100 ◦C, 1200 ◦C, and 1300 ◦C for
5 h. Transmission electron microscopy (TEM) and Rutherford backscattering spectrometry (RBS) were used to
characterize both as-implanted and annealed annealed samples. Sr implantation induced amorphization of SiC,
while co-implantation with He led to the formation of He nano-bubbles within the amorphous SiC matrix. During
annealing, Sr migrated towards the surface, resulting in loss of Sr, cavity formation, and formation of Sr precipitates
in the Sr-SiC samples. In Sr + He-SiC samples, He-induced cavities formed around the projected range of
Sr, inhibiting epitaxial regrowth of SiC. As a result, the Sr distribution became concentrated around these He
cavities, with Sr trapped both in front and behind them. The enhanced migration of Sr in annealed Sr + He-SiC is
attributed to the slower recrystallization of the damaged SiC layer, the presence of larger He-induced cavities,
and increased surface roughness. These findings provide insights into Sr migration the mechanisms in SiC,
relevant for enhancing the safety of nuclear fuels.
Description:
DATA AVAILABILITY : Data will be made available on request.